Research Facilities
Powder X-Ray Diffractometer
PANalytical EMPYREAN (Central Facility) Powder measurements in reflection/transmission mode, GIXRD, Cu - Kα radiation
Description: Powder in reflection/transmission mode, GIXRD thin film, Solid samples.
High Temperature Furnaces
Ants Innovation Pvt Ltd, India. Carbolite Gero, UK.
Description: Solid state synthesis, Annealing under different gas atmosphere
Impedance and Pyroelectric Current Measurement
ECR1252/EQ1; Keysight E4980A and Tektronix 2636B
Description: Impedance, dielectric constant, pyroelectric current up to 800 °C under O2, N2, Air
Ferroelectric/Piezoelectric Analyzer
Radiant Precision LC II, Bulk Piezoelectric Measurement System
Description: Ferroelectric/Piezoelectric measurements ceramics up to 230 °C, 10 kV, 0.5 Hz – 5 kHz
Low Temperature Probe Station
Janis Research Company ST-LN-500
Description: Four probe electrical measurements, DC to 67 GHz, 77K to 475 K
Impedance Analyzer
Solartron 1260A 32 MHz
Description: Impedance and dielectric properties at ambient and non-ambient temperatures
Impedance Analyzer & LCR Meter
Wayne Kerr Electronics, UK 6510B & Keysight, E4980A.
Description: Impedance and dielectric properties at ambient and non-ambient temperatures
Sensitive Source-Measure Unit (SMU)
Keithley 2636B, Keithley 6430
Description: I-V measurements, Transistor Characteristics, Low current measurements.
Photochemical Reactor
Lelicil Pvt Ltd
Description: Photochemical reactions such as catalysis, degradation.
Sputtering cum Thermal Evaporator Unit
Excel instruments, Pune
Description: Growth of metallic and semiconducting thin films
High-Performance Computing Cluster
Tyrone/Camarero DS300TW-14R; Intel(R) Xeon(R) Gold 6248R; Intel(R) Xeon(R) CPU E5-2697 v4 (Part of Centre for Computational and Integrative Sciences)
Description: Multi-scale modeling with hundreds of atoms at the quantum level to hundreds of thousands of atoms at all-atom level; Simulation of nanomaterials, biophysical systems etc.
Spin Coating Unit & UV Ozone Cleaner
HOLMARC PHO-TH-05 & HO-TH-UVT150.
Description: Thin film Deposition through spin coat; Remove bio contaminants from substrates.
Deposition Furnace (LPCVD)
Marine India, RT-500C & HIOKI, Japan, IM3536.
Description: High temperature impedance measurement, RT-500 °C
LCR Meter & HT set up
Three Zone furnace Carbolite Gero EZS- 3G 12/600
Description: Thin film deposition using different precursors; up to 1100°C
